The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Feb. 06, 2024
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventors:

Ho-Sub Yoon, Daejeon, KR;

Jae-Hong Kim, Daejeon, KR;

Jae-Yoon Jang, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/16 (2022.01);
U.S. Cl.
CPC ...
G06V 40/172 (2022.01); G06V 40/171 (2022.01);
Abstract

Disclosed herein are a facial recognition method and apparatus based on masking. The facial recognition method based on masking includes performing detection and normalization of a face area including five landmarks in an input image, separating a face portion other than a portion covered by an obstacle in the detected face area, generating a mask corresponding to the separated face portion when there is a portion covered by an obstacle in the separated face portion, applying the mask to an image in a face image registration database and extracting a feature of a masking region, and determining whether it is an identical person based on the extracted feature value.


Find Patent Forward Citations

Yoon, Ho-Sub. (2026). Facial recognition method and apparatus based on masking (U.S. Patent No. 12738094). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12738094

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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