The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Dec. 26, 2023
Applicant:
Deepvisions Co., Ltd., Seoul, KR;
Inventors:
Bong Su Kang, Seoul, KR;
Jun Sang Cho, Seoul, KR;
Won Hee Jo, Seoul, KR;
Nalinh Thoummala, Seoul, KR;
Sung Jae Lee, Seoul, KR;
Hong Kyu Lee, Seoul, KR;
Assignee:
DEEPVISIONS CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 20/52 (2022.01); G06V 10/25 (2022.01); G06V 20/40 (2022.01);
U.S. Cl.
CPC ...
G06V 20/52 (2022.01); G06V 10/25 (2022.01); G06V 20/40 (2022.01);
Abstract
In a fine dust monitoring method, it is checked whether or not a preset first measurement event occurs in an area covered by the monitoring device, an occurrence point of the first measurement event is photographed when the first measurement event occurs, and a fine dust concentration of a point where the first measurement event occurred by inputting a photographed video image according to the first measurement event is outputted to a pre-trained first deep learning model.