The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Sep. 24, 2021
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Ioannis Nousias, San Diego, CA (US);

Matthieu Jean Olivier Dupre, La Jolla, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 17/08 (2006.01); G01S 17/894 (2020.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 17/08 (2013.01); G01S 17/894 (2020.01); G06T 2207/10028 (2013.01);
Abstract

Systems and techniques are described for generating depth map(s). For instance, a process can include obtaining a frame including a reflected pattern of light generated based on a pattern of light that is based on a primitive including a set of uniquely identifiable features. The process can include determining, using a time-of-flight (ToF) sensor, a first distance measurement associated with a pixel of the frame, and determining a search space within the primitive based on the first distance measurement. The process can include determining, based on searching the search space, a feature of the primitive corresponding to a region around the pixel of the frame. The process can include determining a second distance measurement associated with the pixel of the frame based on determining the feature of the primitive. The process can include generating a depth map based at least in part on the second distance measurement.


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