The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Aug. 11, 2023
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Yunxiao Shi, San Diego, CA (US);

Hong Cai, San Diego, CA (US);

Fatih Murat Porikli, San Diego, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 7/50 (2017.01);
U.S. Cl.
CPC ...
G06T 7/50 (2017.01); G06T 2207/10024 (2013.01); G06T 2207/10028 (2013.01); G06T 2207/20084 (2013.01);
Abstract

A processor-implemented method for attention-based depth completion includes receiving, by an artificial neural network (ANN), an input. The input includes an image and a sparse depth measurement. The ANN extracts multi-scale visual features of the input. The ANN applies a self-attention mechanism to the multi-scale visual features to generate a set of attended multi-scale visual features. The ANN generates a dense depth map based on the set of attended multi-scale visual features.


Find Patent Forward Citations

Shi, Yunxiao. (2026). Attention-based refinement for depth completion (U.S. Patent No. 12737900). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12737900

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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