The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

May. 13, 2022
Applicant:

Tata Consultancy Services Limited, Mumbai, IN;

Inventors:

Kuldeep Singh, Pune, IN;

Sri Harsha Nistala, Pune, IN;

Venkataramana Runkana, Pune, IN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 17/02 (2006.01); C21B 5/00 (2006.01); C22B 1/16 (2006.01); G05B 13/02 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); C21B 5/006 (2013.01); C22B 1/16 (2013.01); G05B 13/0265 (2013.01);
Abstract

In applications such as adaptive learning of physics-based and data-driven models associated with industrial plants, the models are corrected periodically by taking into consideration the dynamic changes occurring in plant conditions and related data. However, accuracy of adaptive learning depends on accuracy of ground truth data being used as reference data. The disclosure herein generally relates to data preprocessing, and, more particularly, to a method and system for ground truth profile correction and instance selection. The system performs a ground truth profile correction for ground truth profiles having a Profile Deviation Index (PDI) value exceeding a threshold of distortion, to reduce the PDI value, and in turn reduce the distortion in the ground truth profiles. Further, the system performs a data instance selection to identify and remove outliers, and the data that remains after the data instance selection may be then used for applications such as model generation or retuning.


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