The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Nov. 13, 2023
Applicant:

Adobe Inc., San Jose, CA (US);

Inventors:

Difan Liu, Amhert, MA (US);

Matthew David Fisher, Burlingame, CA (US);

Michaël Yanis Gharbi, San Francisco, CA (US);

Oliver Wang, Seattle, WA (US);

Alec Stefan Jacobson, Toronto, CA;

Vikas Thamizharasan, Amherst, MA (US);

Evangelos Kalogerakis, Sunderland, MD (US);

Assignee:

Adobe Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 40/109 (2020.01); G06T 11/23 (2026.01); G06T 11/40 (2006.01);
U.S. Cl.
CPC ...
G06F 40/109 (2020.01); G06T 11/23 (2026.01); G06T 11/40 (2013.01);
Abstract

In implementation of techniques for vector font generation based on cascaded diffusion, a computing device implements a glyph generation system to receive a sample glyph in a target font and a target glyph identifier. The glyph generation system generates a rasterized glyph in the target font using a raster diffusion model based on the sample glyph and the target glyph identifier, the rasterized glyph having a first level of resolution. The glyph generation system then generates a vector glyph using a vector diffusion model by vectorizing the rasterized glyph, the vector glyph having a second level of resolution different than the first level of resolution. The glyph generation system then displays the vector glyph in a user interface.


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