The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Jun. 27, 2022
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Theodore G. Van Kessel, Millbrook, NY (US);

Levente Klein, Tuckahoe, NY (US);

Bruce Gordon Elmegreen, Goldens Bridge, NY (US);

Eloisa Bentivegna, Warrington, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/27 (2020.01); G06F 30/28 (2020.01); G06N 20/20 (2019.01); G06T 3/40 (2006.01); G06T 7/73 (2017.01);
U.S. Cl.
CPC ...
G06F 30/27 (2020.01); G06F 30/28 (2020.01); G06N 20/20 (2019.01); G06T 3/40 (2013.01); G06T 7/73 (2017.01); G06T 2207/10032 (2013.01); G06T 2207/20081 (2013.01);
Abstract

In an approach for estimating emission source location from satellite plume data, a processor creates a dataset of plume concentration data. A processor down samples the dataset to an array at satellite resolution. A processor partitions the array into two separate datasets according to a preset proportion. A processor trains two machine learning models on at least one of the two separate datasets, wherein a first machine learning model of the two machine learning models is for identifying a presence of a plume and a second machine learning model of the two machine learning models is for identifying a source position and magnitude of the plume. A processor applies the two machine learning models to new concentration data.


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