The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Dec. 16, 2024
Applicant:

Dell Products L.p., Round Rock, TX (US);

Inventors:

Alexander Shknevsky, Fair Lawn, NJ (US);

Uri Shabi, Tel Mond, IL;

Assignee:

Dell Products L.P., Round Rock, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/06 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0652 (2013.01); G06F 3/0604 (2013.01); G06F 3/0679 (2013.01);
Abstract

Techniques for providing improved advanced deduplication efficiency by candidate sequence selection. The techniques include generating a score for each candidate sequence from among multiple candidate sequences based on dedupe criteria, such as a number of dedupe hints associated with pages in the candidate sequence. The techniques include performing an unaligned dedupe process on the candidate sequence(s) having the highest or higher scores. The dedupe criteria may include a compressibility of each page in the candidate sequence, a bias toward longer matching target sequences, and so on. The techniques include obtaining a correlation between an average score of a number of candidate sequences and a corresponding average unaligned DRR gain, predicting, using the correlation, an expected unaligned DRR gain based on a score for a candidate sequence, and performing an unaligned dedupe process on the candidate sequence based on whether the score and the expected unaligned DRR gain exceed minimum thresholds.


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