The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Jan. 06, 2022
Interface Technology (Chengdu) Co., Ltd., Chengdu City, CN;
Interface Optoelectronics (Shenzhen) Co., Ltd., Shenzhen City, CN;
General Interface Solution Limited, Zhunan Township, TW;
Hung-Hsin Shih, Shenzhen City, CN;
Interface Technology (ChengDu) Co., Ltd., Chengdu City, CN;
Interface Optoelectronics (Shenzhen) Co., Ltd., Shenzhen City, CN;
General Interface Solution Limited, Miaoli County, TW;
Abstract
Methods for fabricating an optical waveguide and a display device and a photomask used therein is provided. Firstly, a photomask is provided, wherein the photomask has light blocking structures regularly distributed. A first light curing resin layer is formed on a first transparent substrate. Next, the photomask is placed on the first light curing resin layer. The first light curing resin layer is irradiated and cured with incident light through the photomask and the light blocking structures to have a first curing level and a first refractive index. The first curing level and the first refractive index, corresponding to each other, are periodically distributed. Finally, the photomask is removed from the first light curing resin layer to form an optical waveguide with the first light curing resin layer having the first curing level that is periodically distributed and the first transparent substrate.