The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Apr. 29, 2022
Rolic Technologies Ag, Allschwil, CH;
Martin Urbanski, Bruchsal, DE;
Hans Leonhard Prechtel, Basel, CH;
ROLIC TECHNOLOGIES AG, Allschwil, CH;
Abstract
A method for creating a desired surface microstructure includes first providing an original microstructured surface having a structure depth between 10 nm and 100 μm. The topography of this original microstructure is digitally acquired using a 3D surface profilometer and processed into structure-describing data suitable for a writing tool. The processed data may include lateral scaling, anisotropic or non-periodic features, binarization, or composition from distinct basic microstructure elements. The writing tool then applies this data to a target material, optionally in a resin, to produce a desired microstructure with modifiable depth and surface microstructure aspect ratio. The method enables precise fabrication of optically effective regions or regions optimized for liquid-crystal alignment.