The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Jul. 20, 2022
Applicant:

Georgia Tech Research Corporation, Atlanta, GA (US);

Inventors:

Kenneth Wayne Allen, Atlanta, GA (US);

Daniel J.P. Dykes, Atlanta, GA (US);

David W. Landgren, Atlanta, GA (US);

Christopher Peterson, Atlanta, GA (US);

David R. Reid, Atlanta, GA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/12 (2006.01); G02B 1/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/12 (2013.01); G02B 1/002 (2013.01);
Abstract

An exemplary method and system are disclosed comprising retroreflective metastructures formed with a plurality of metasurface arrays configured to destructively cancel or interfere, in part, with one another to reduce specular mode associated scattering or reflection. In some embodiments, the retroreflective metastructures are formed by a combination of metasurfaces with different lattice spacings that can exhibit enhanced bandwidth and angular range at near-grazing angles to provide enhanced retroreflective electromagnetic responses.


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