The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Aug. 30, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Jaehyung Ahn, Suwon-si, KR;
Inseok Park, Suwon-si, KR;
Joonseo Song, Suwon-si, KR;
Souk Kim, Suwon-si, KR;
Younghoon Sohn, Suwon-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); G06T 7/00 (2017.01); G06T 7/80 (2017.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G06T 7/0004 (2013.01); G06T 7/80 (2017.01); G01N 2223/303 (2013.01); G01N 2223/401 (2013.01); G01N 2223/6116 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A wafer measurement apparatus includes an electronic-optical system configured to irradiate a wafer with an electron beam and acquire a raw signal by detecting electrons emitted by the wafer, and an image processing device configured to convert the raw signal acquired by the electronic-optical system into image data. The electronic-optical system includes a detector configured to acquire the raw signal. The detector calibrates a gain offset using a difference in electron emission yields of different materials.