The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Nov. 03, 2023
Toflo Corporation, Tokyo, JP;
Takahiro Kawamoto, Tokyo, JP;
Hiroyoshi Amano, Tokyo, JP;
Taichi Baba, Tokyo, JP;
Kurumi Chino, Tokyo, JP;
TOFLO CORPORATION, Tokyo, JP;
Abstract
Provided is a flow rate control device capable of suppressing variation of supply pressure caused by variation of set flow rate and suppressing influence of pressure loss and cavitation on a secondary side. The flow rate control device includes: a flow rate regulating valve that regulates a flow rate of fluid flowing in a flow path; a flow meter that measures the flow rate of the fluid flowing in the flow path; and a control portion that controls an opening degree of the flow rate regulating valve based on a measurement result of the flow meter, the flow rate regulating valve is a three-way valve for dividing to regulate fluid flowing in from an inflow port to a first outflow port and a second outflow port, the flow meter is connected to the second outflow port side, and a multistage throttle orifice for decompressing the pressure of the fluid in stages is provided on the first outflow port side.