The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Jan. 10, 2024
Applicant:

L'air Liquide, Societe Anonyme Pour L'etude ET L'exploitation Des Procedes Georges Claude, Paris, FR;

Inventors:

Daehyeon Kim, Seoul, KR;

Jooho Lee, Seoul, KR;

Wontae Noh, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C01F 11/02 (2006.01); C07F 3/00 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C01F 11/02 (2013.01); C07F 3/00 (2013.01); C23C 16/404 (2013.01); C23C 16/45534 (2013.01);
Abstract

A method of forming Group 2 metal containing films on a substrate comprises a) exposing the substrate to a vapor of a Group 2 metal containing film forming composition that contains an alkaline earth metal precursor having the formula: wherein M is Be, Mg, Ca, Sr, or Ba; R-Reach independently are a C-Calkyl group, a fluoro group, an alkylsilyl group, a germyl group, an alkylamide or an alkylsilylamide, b) depositing at least part of the alkaline earth metal precursor onto the substrate to form a Group 2 metal-containing film through a vapor deposition process; and c) repeating a) and b) until a desired thickness of the Group 2 metal-containing film is formed.


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