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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12735769 B1

PDFFull Text
Date of Patent:
Sep. 15, 2026

Filed:

Dec. 08, 2025

Deployable multi-zone rotary-kiln system and method for recovery of gallium oxide from electronic waste

Applicant:

Simple Approach Systems, Inc., Schaumburg, IL (US);

Inventors:

Amirali G. Rehmat, Hanover Park, IL (US);

Renee L. Comly, Marshall, VA (US);

Alex Mathew, Palatine, IL (US);

Manpreet Kaur, Roselle, IL (US);

Assignee:

Simple Approach Systems, Inc., Schaumburg, IL (US);

Attorneys:

FisherBroyles, LLP

Joseph Hyosuk Kim

Primary Examiner:

Michael Forrest

Int. Cl.
CPC ...
C22B 58/00 (2006.01); B09B 3/35 (2022.01); B09B 3/40 (2022.01); C22B 7/00 (2006.01); F27B 7/02 (2006.01); F27B 7/06 (2006.01); F27B 7/14 (2006.01); F27B 7/26 (2006.01); F27B 7/38 (2006.01); F27B 7/42 (2006.01);
U.S. Cl.
CPC ...
C22B 58/00 (2013.01); B09B 3/35 (2022.01); B09B 3/40 (2022.01); C22B 7/007 (2013.01); F27B 7/02 (2013.01); F27B 7/06 (2013.01); F27B 7/14 (2013.01); F27B 7/26 (2013.01); F27B 7/383 (2013.01); F27B 7/42 (2013.01);
Abstract

A deployable system and method are provided for recovering gallium oxide from gallium-nitride-bearing electronic waste in a single, continuous, multi-zone rotary-kiln reactor. Shredded E-Waste is introduced through a sealed feed assembly into a refractory-lined kiln having a first zone operating at about 700° C.-900° C. for partial oxidation of organics and a second zone operating at about 1000° C.-1200° C. for oxidation of gallium nitride to gallium oxide. Controlled oxidant injection and kiln rotation of 0.25-3 rpm maintains residence times of 0.5-2 hours for complete conversion. An expanded velocity-reduction chamber separates oxidized solids from gases, while a downstream heat-recovery and dry-neutralization system removes acid gases and volatile metals without producing liquid effluent. The resulting porous gallium oxide is directly leachable to yield high-purity gallium. The modular, containerized design allows field deployment and scalability, and may also recover indium, tin, cobalt, lithium, and rare-earth oxides from other composite electronic wastes.

Find Patent Forward Citations

Rehmat, Amirali. (2026). Deployable multi-zone rotary-kiln system and method for recovery of gallium oxide from electronic waste (U.S. Patent No. 12735769). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12735769

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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