The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Aug. 06, 2020
Applicant:

Maruzen Petrochemical Co., Ltd., Tokyo, JP;

Inventors:

Hiromichi Aihara, Ichihara, JP;

Tomohiro Masukawa, Ichihara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/12 (2006.01); C08F 220/28 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C08F 220/281 (2020.02); C08F 8/12 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01);
Abstract

[Problem to be Solved] The present invention provides a polymer comprising a structural unit derived from p-hydroxystyrene and a structural unit having a structure in which a carboxylic acid is protected by an acetal group, wherein the structural unit generated by elimination of the acetal group or migration of the acetal group during the production process is extremely small; and a process for producing the same. [Means for Solving the Problem] A solution containing a polymer comprising a structural unit derived from p-acetoxystyrene and a structural unit having a structure in which a carboxylic acid is protected by an acetal group is subjected to deprotection reaction at 50° C. or lower in the presence of a base in which a pKa of a conjugated acid is 12 or more.


Find Patent Forward Citations

Aihara, Hiromichi. (2026). Polymer and method for producing same, and resin composition for resist (U.S. Patent No. 12735519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12735519

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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