The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Aug. 09, 2023
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Postech Research and Business Development Foundation, Pohang-si, KR;
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, Daejeon, KR;
POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION, Pohang-si, KR;
Abstract
The present disclosure relates to a copper-based catalyst for reverse water gas reaction including a gas-permeable amorphous shell formed by strong metal-support interaction. The inventors of the present disclosure synthesized a copper-ceria solid solution and then adjusted the surface defect sites of the solid solution, thereby producing a catalyst including enhanced surface defect sites and having a gas-permeable amorphous shell structure formed on each copper particle. When the catalyst production method according to the present disclosure is used, it is possible to synthesize a catalyst including a structure consisting only of very small Cu particles encapsulated by surface shells and Cu sites incorporated into the CeOlattice structure. When the synthesized catalyst is used in the RWGS reaction, it exhibits excellent low-temperature activity, high activity and durability, compared to conventional precious metal catalysts. In addition, even when the catalyst of the present disclosure is supported on a monolith and used to perform the RWGS reaction on a bench scale, it exhibits high activity, COconversion and durability, which are comparable with those in the laboratory scale, indicating at it may be applied to an actual process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile