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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12733725 B1

PDFFull Text
Date of Patent:
Sep. 15, 2026

Filed:

Oct. 29, 2020

Automated total nail care systems, devices and methods

Applicant:

10beauty, Inc., Burlington, MA (US);

Inventors:

Alexander Shashou, New York, NY (US);

Justin Effron, New York, NY (US);

Gabe Greeley, Somerville, MA (US);

Marcus R. Williams, Watertown, MA (US);

Margaret Mathieu, Arlington, MA (US);

Lucile Driscoll, Boston, MA (US);

Lu Lyu, Medford, MA (US);

Charles C. Shortlidge, Boston, MA (US);

Peter Duerst, Cambridge, MA (US);

Douglas Stewart, Quincy, MA (US);

Chris Casey, Lexington, MA (US);

Ndungu Muturi, Oakland, CA (US);

Ryan Wood, Sausalito, CA (US);

Zhi Teoh, Somerville, MA (US);

Harald Quintus-Bosz, Newton, MA (US);

Jesse Gray, Somerville, MA (US);

Matt Berlin, Somerville, MA (US);

Juhi Kalra, San Francisco, CA (US);

Christine Noh, Cambridge, MA (US);

Oliver Zhang, San Francisco, CA (US);

Will Burke, San Francisco, CA (US);

Chris Evans, Amherst, NH (US);

Allison Tse, San Francisco, CA (US);

Anthony Parker, New Ipswich, NH (US);

Eric Maxwell, Charlestown, MA (US);

Genevieve Laing, San Francisco, CA (US);

Assignee:

10Beauty, Inc., Burlington, MA (US);

Attorney:

Mintz Levin Cohn Ferris Glovsky and Poneo P C

Primary Examiner:

Harry Y Oh

Int. Cl.
CPC ...
A45D 29/20 (2006.01); A45D 29/00 (2006.01); A45D 29/06 (2006.01); A45D 29/14 (2006.01); A45D 29/22 (2006.01); A45D 44/00 (2006.01); B25J 5/04 (2006.01); B25J 9/02 (2006.01); B25J 9/16 (2006.01); B25J 11/00 (2006.01); B25J 15/00 (2006.01); B41J 3/407 (2006.01); B41M 1/40 (2006.01); G06T 7/70 (2017.01); H04N 1/409 (2006.01); H04N 1/60 (2006.01);
U.S. Cl.
CPC ...
A45D 29/20 (2013.01); A45D 29/007 (2013.01); A45D 44/00 (2013.01); B25J 9/026 (2013.01); B25J 9/1697 (2013.01); B25J 11/00 (2013.01); B25J 15/0057 (2013.01); B25J 15/0061 (2013.01); B25J 15/0066 (2013.01); B41J 3/4073 (2013.01); B41M 1/40 (2013.01); G06T 7/70 (2017.01); H04N 1/409 (2013.01); A45D 29/06 (2013.01); A45D 29/14 (2013.01); A45D 29/22 (2013.01); G06T 2207/30196 (2013.01); Y10S 901/02 (2013.01); Y10S 901/14 (2013.01); Y10S 901/30 (2013.01);
Abstract

A system, device and method for nail care is provided. The nail care system includes a shaping system, a polish removal system and/or a cuticle management system; a vision system; a nail polish application system; and a mobility system. The nail system may further include an accelerated drying system, a hand massage system, a nail identification/diagnosis/estimation of conditions system, an enclosure, a hand/foot rest system, a computer software system, a computer hardware system, a cartridge/pod system, and a multi-tool system. Related apparatuses, techniques and articles are also described.

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