The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Jun. 07, 2024
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Shinichi Taniguchi, Kyoto, JP;

Akihiro Iwasaki, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); B08B 3/04 (2006.01); H01L 21/67 (2006.01); H10P 72/00 (2026.01); H10P 72/76 (2026.01); H10P 72/30 (2026.01);
U.S. Cl.
CPC ...
H10P 72/7618 (2026.01); B08B 3/04 (2013.01); H10P 72/0416 (2026.01); H10P 72/7621 (2026.01); H10P 72/3412 (2026.01);
Abstract

A substrate processing apparatus, the apparatus including: a batch type processing unit; a single wafer type processing unit; a posture turning unit; a first transport unit that transports the plurality of substrates processed by the batch type processing unit to the posture turning unit; and a second transport unit that transports the plurality of substrates brought into a horizontal posture by the posture turning unit to the single wafer type processing unit, in which the posture turning unit holds the plurality of substrates in a state where an interval above upper surfaces of the plurality of substrates is narrow when turning a posture of the plurality of substrates, and holds the plurality of substrates in a state where an interval above upper surfaces of the plurality of substrates is wide when transferring the plurality of substrates after the plurality of substrates are brought into a horizontal posture.


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