The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Jun. 16, 2023
Asm Ip Holding B.v., Almere, NL;
Arun Thottappayil, Hwaseong, KR;
Dongrak Jung, Hwaseong, KR;
ASM IP Holding B.V., Almere, NL;
Abstract
Apparatus, particularly reaction chamber for processing semiconductor substrate is presented. A reaction chamber with gas exit flow control capability comprises an upper body, a substrate supporting part, a shower head for letting in gas which is used for processing the substrate, a lower body comprising duct, wherein the duct has a multiple of duct holes and a flow control liner configured to surround the duct and the flow control liner has a multiple of flow holes, wherein the duct holes and flow holes are used to control the exit flow of the gas used for substrate processing, and the flow control liner may rotate around so that the duct holes and the flow holes can be overlapped. The duct can have scribe mark for various hole sizes and shapes.