The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Feb. 05, 2021
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Akihiro Nojima, Tokyo, JP;
Yosuke Horie, Tokyo, JP;
Masaaki Hirano, Tokyo, JP;
Eiichiro Takada, Tokyo, JP;
Yuka Miyake, Tokyo, JP;
Takamichi Mori, Tokyo, JP;
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 35/10 (2006.01); G01N 35/02 (2006.01);
U.S. Cl.
CPC ...
G01N 35/1004 (2013.01); G01N 35/025 (2013.01); G01N 35/1067 (2013.01);
Abstract
An object of the invention is to provide a technique capable of enhancing a cleaning effect of a dispensing probe while preventing an influence on an analysis throughput. In a method according to the invention, an inner surface of a dispensing probe is cleaned by repeating an inner surface liquid-feeding period in which a cleaning liquid is fed to an inside of the dispensing probe and an inner surface stop period in which the cleaning liquid is not fed.