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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12729320 B1

PDFFull Text
Date of Patent:
Sep. 08, 2026

Filed:

May. 31, 2021

Anti-reflection substrate

Applicant:

Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;

Inventors:

Yoshiaki Yamamoto, Saitama, JP;

Shota Wakayama, Tokyo, JP;

Assignee:

MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;

Attorney:

GREENBLUM & BERNSTEIN, P.L.C.

Primary Examiner:

Thomas K Pham

Assistant Examiner:

Ruby L Kauffman

Int. Cl.
CPC ...
C09D 151/08 (2006.01); B32B 27/08 (2006.01); B32B 27/28 (2006.01); B32B 27/36 (2006.01); C09D 175/06 (2006.01); G02B 1/111 (2015.01); G02B 1/14 (2015.01);
U.S. Cl.
CPC ...
C09D 151/08 (2013.01); C09D 175/06 (2013.01); G02B 1/111 (2013.01); B32B 27/08 (2013.01); B32B 27/285 (2013.01); B32B 27/36 (2013.01); B32B 27/365 (2013.01); B32B 2250/24 (2013.01); B32B 2255/10 (2013.01); B32B 2255/20 (2013.01); B32B 2255/205 (2013.01); B32B 2255/26 (2013.01); B32B 2307/408 (2013.01); G02B 1/14 (2015.01);
Abstract

Provided is an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order: a substrate layer (A), a hard coating layer (B), a light absorbing layer (C), and a low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, where the film thickness of the light absorbing layer (C) is 1 to 20 nm.

Find Patent Forward Citations

Yamamoto, Yoshiaki. (2026). Anti-reflection substrate (U.S. Patent No. 12729320). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12729320

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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