The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Sep. 22, 2021
Kurita Water Industries Ltd., Tokyo, JP;
Nobuko Gan, Tokyo, JP;
KURITA WATER INDUSTRIES LTD., Tokyo, JP;
Abstract
A production device for pH/redox potential-adjusted water () of the present invention includes a platinum group metal-supporting resin column () that is provided in a supply line () of ultrapure water (W) and a pH adjuster tank () and a redox potential adjuster tank () that are provided downstream the platinum group metal-supporting resin column (). A membrane-type degassing device () is provided downstream them, and a gas-dissolving membrane () is disposed downstream the membrane-type degassing device (). A cleaning water quality monitoring mechanism including a pH meter, an ORP meter, and an inert gas concentration measuring means is provided downstream the gas-dissolving membrane () of the supply line (). The cleaning water quality monitoring mechanism is connected to a control means (not illustrated). The control means is capable of controlling a pump (B) of the pH adjuster tank (), a pump (B) of the redox potential adjuster tank (), and the gas-dissolving membrane () based on the measurement values of the cleaning water quality monitoring mechanism. With such a configuration, the present invention can suppress dissolution of metals to a minimum level in a rinsing step for the surfaces of wafers on which chromium group elements are exposed.