The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Nov. 16, 2024
Applicant:

Penny Precision Llc, Nashua, NH (US);

Inventor:

Ryan Wade Penny, Merrimack, NH (US);

Assignee:

Penny Precision, LLC, Nashua, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/106 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); B33Y 70/00 (2020.01); C01D 15/04 (2006.01); C01F 11/22 (2006.01);
U.S. Cl.
CPC ...
C01F 11/22 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B33Y 70/00 (2014.12); C01D 15/04 (2013.01); C01P 2006/60 (2013.01);
Abstract

Methods and systems for direct-write liquid phase epitaxy of ionic materials are provided for herein, and relate to the manufacture of metal halide optics among other applications. Deposition of the ionic material is induced by mixing at least two fluids of differing composition, wherein the solubility limit of the ionic material in the mixed solution is lower than predicted from a linear combination of the original fluids. This deposition process is spatially controlled using a printhead, enabling localized material deposition and the ability to create arbitrary geometries in turn. In some cases, at least one of the fluids is saturated with the ionic material and surrounds the substrate upon which deposition occurs.


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