The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Aug. 30, 2022
Applicant:

Readily3d SA, Lausanne, CH;

Inventors:

Paul Delrot, Morges, CH;

Damien Loterie, Ecublens, CH;

Assignee:

Readily3D SA, Lausanne, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/85 (2021.01); B28B 1/00 (2006.01); B28B 17/00 (2006.01); B29C 64/124 (2017.01); B29C 64/153 (2017.01); B29C 64/255 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); B29K 105/00 (2006.01); B29K 105/16 (2006.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/85 (2021.01); B28B 1/001 (2013.01); B28B 17/0081 (2013.01); B29C 64/124 (2017.08); B29C 64/153 (2017.08); B29C 64/255 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B29K 2105/0032 (2013.01); B29K 2105/16 (2013.01);
Abstract

The invention discloses a method and system to digitally compensate for reactivity inhomogeneities of a photoresponsive material within a build volume of an additive manufacturing system, which offers significant advantages for the production of high-fidelity and high-accuracy three-dimensional objects. The method comprises a) Providing a digital model of said three-dimensional object, b) defining a sequence of patterns of light () from said digital model, and c) irradiating with each of said patterns of light () according to the defined sequence a photoresponsive material () that is capable of alteration of its material phase upon irradiation by light, thereby creating a three-dimensional distribution of alterations within the photoresponsive material () which physically reproduces said three-dimensional object, thereby creating the three-dimensional object. The step of defining said sequence of patterns of light () involves a compensation of an expected light intensity of said patterns of light () for any deviations of an alteration rate in said photoresponsive material caused by auto-acceleration or auto-deceleration, so as to obtain a constant alteration rate throughout said photoresponsive material (), wherein said compensation is computed from a predicted three-dimensional light dose distribution in the photoresponsive material () and a function describing an alteration response of the photoresponsive material () to light dose.


Find Patent Forward Citations

Delrot, Paul. (2026). Method for digital analytic correction of photoresponsive material reactivity in additive manufacturing (U.S. Patent No. 12728601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12728601

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…