The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

May. 26, 2023
Applicant:

Honeywell Safety Products Usa, Inc., Charlotte, NC (US);

Inventors:

Charlie Han, Morris Plains, NJ (US);

Kevin Lu, Morris Plains, NJ (US);

Robin Xiang, Morris Plains, NJ (US);

Jerry Shen, Morris Plains, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41D 13/11 (2006.01); A41D 31/10 (2019.01); A41D 31/12 (2019.01); A41D 31/30 (2019.01); A62B 23/02 (2006.01); B32B 5/02 (2006.01); B32B 5/26 (2006.01);
U.S. Cl.
CPC ...
A41D 13/1192 (2013.01); A41D 31/10 (2019.02); A41D 31/12 (2019.02); A41D 31/305 (2019.02); A62B 23/025 (2013.01); B32B 5/022 (2013.01); B32B 5/26 (2013.01); A41D 2500/30 (2013.01); B32B 2262/0253 (2013.01); B32B 2262/0284 (2013.01); B32B 2307/726 (2013.01); B32B 2571/00 (2013.01);
Abstract

Embodiments relate generally to systems and methods for absorbing moisture within a face mask worn by a user. A face mask may comprise at least one layer of filtration material configured to filter one or more harmful substances from the air breathed by a user; at least one layer of absorbent material configured to absorb moisture exhaled by the user, wherein the at least one layer of absorbent material spans the entire inner surface area of the mask; at least one layer of waterproof material located between the at least one layer of filtration material and the at least one layer of absorbent material configured to prevent moisture from the absorbent material from contacting the filtration material; and at least one layer of anti-bacterial material located adjacent to the at least one layer of absorbent material and forming the inner surface of the mask.


Find Patent Forward Citations

Han, Charlie. (2026). System and method for absorbing moisture within a face mask (U.S. Patent No. 12727632). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12727632

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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