The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2026

Filed:

Apr. 29, 2022
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Swaminathan Sankaran, Allen, TX (US);

Adam Fruehling, Garland, TX (US);

Baher Haroun, Allen, TX (US);

Scott Robert Summerfelt, Garland, TX (US);

Benjamin Stassen Cook, Los Gatos, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/66 (2006.01); H01Q 1/22 (2006.01); H01Q 9/04 (2006.01); H10W 44/20 (2026.01);
U.S. Cl.
CPC ...
H10W 44/20 (2026.01); H01Q 1/2283 (2013.01); H01Q 9/0407 (2013.01); H10W 44/248 (2026.01);
Abstract

An integrated circuit (IC) includes a semiconductor substrate having a first surface and a second surface opposite the first surface. A through wafer trench (TWT) extends from the first surface of the semiconductor substrate to the second surface of the semiconductor substrate. Dielectric material is in the TWT. An interconnect region has layers of dielectric on the first surface of the substrate. The interconnect region has a conductive transmit patch. An antenna is formed, at least in part, by the dielectric material in the TWT and the transmit patch in the interconnect region. The antenna is configured to transmit or receive electromagnetic radiation between the transmit patch and the second surface of the semiconductor substrate through the dielectric material within the trench.


Find Patent Forward Citations

Loading…