The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Sep. 24, 2021
Ntt, Inc., Tokyo, JP;
NTT, Inc., Tokyo, JP;
Abstract
In the inspection pattern T for inspecting a processing state of a mesa (monitoring a fabrication accuracy against the expected pattern of a mesa) used for an actual element M, the actual element M includes a mesa formed by etching a substrate, and an electrode formed on the mesa, the inspection pattern T includes a mesa formed by etching the substrate, and a thin film that is formed at least on an upper surface of the inspection pattern portion T and has a thickness smaller than the thickness of the electrode, an etching state of the mesa is evaluated on the basis of a difference between the shape of the inspection pattern portion T and the shape of the thin film, and a lateral etching amount at the time of etching is quantitatively and accurately evaluated with a non-destructive inspection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile