The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Apr. 07, 2023
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Ecole Polytechnique, Palaiseau Cedex, FR;
Ecole Nationale Superieure DE Techniques Avancees, Palaiseau Cedex, FR;
Henri Vincenti, Gif sur Yvette, FR;
Adrien Leblanc, Palaiseau, FR;
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
ECOLE POLYTECHNIQUE, Palaiseau, FR;
ECOLE NATIONALE SUPÉRIEURE DE TECHNIQUES AVANCÉES, Palaiseau, FR;
Abstract
A method for accelerating electrons using laser-plasma interaction, wherein at least one laser pulse is directed onto a surface of a target in the condensed state, the surface being covered with a gas layer, the intensity of the at least one pulse being sufficient in order to: in a step A, generate, from the target in the condensed state, a dense plasma; in a step B, after reflection by the dense plasma, generate a wakefield in the gas layer; in a step C, heat the electrons of the dense plasma to an energy such that a bunch of the electrons is injected into the wakefield in order to be accelerated there, the pulse, or at least the pulse intended to be reflected by the dense plasma and to heat the electrons of the latter, being s-polarized and obliquely incident on the target.