The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Sep. 27, 2022
Mycronic Ab, Taby, SE;
Martin Glimtoft, Alvsjo, SE;
Jan Sterner, Sollentuna, SE;
Robert Eklund, Taby, SE;
Fredric Ihren, Taby, SE;
Pontus Stenstrom, Akersberga, SE;
Mycronic AB, Taby, SE;
Abstract
A method for preparing pixel data for writing with SLM comprises obtaining (S) of data representing a pattern. The data is rasterized (S) to a grid of pixels. The rasterizing comprises assigning (S) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S).