The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Dec. 09, 2024
Samsung Sdi Co., Ltd., Yongin-si, KR;
Taegeun Seong, Suwon-si, KR;
Sumin Jang, Suwon-si, KR;
Seol Hee Lim, Suwon-si, KR;
Eunmi Kang, Suwon-si, KR;
Yaeun Seo, Suwon-si, KR;
Seung-Wook Shin, Suwon-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Abstract
A semiconductor photoresist composition includes a Sn-containing organometallic compound; a compound represented by Chemical Formula 1; and a solvent. A method of forming patterns using the semiconductor photoresist composition includes: providing an etching-objective layer on a substrate; coating the semiconductor photoresist composition on the etching-objective layer to form a photoresist layer; patterning the photoresist layer to form a photoresist pattern; and etching the etching-objective layer using the photoresist pattern as an etching mask.