The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Jan. 03, 2024
Zs Systems Llc, Lafayette, IN (US);
Purdue Research Foundation, West Lafayette, IN (US);
Sergey Zakharov, Lafayette, IN (US);
Alexander Kildishev, West Lafayette, IN (US);
Omer Yesilyurt, West Lafayette, IN (US);
ZS Systems LLC, Lafayette, IN (US);
Purdue Research Foundation, West Lafayette, IN (US);
Abstract
A metalenslet beam homogenizer offers an alternative to classical beam homogenization techniques by leveraging flat optical metasurfaces. The metalenslet beam homogenizer would be beneficial, for example, for high power laser applications, such as laser material processing, digital projection, optical lithography, and additive manufacturing in which it is necessary to expose a certain area on a workpiece to a well-defined amount of optical radiation. The metalenslet beam homogenizer provides benefits by enhancing the beam homogenization quality, reducing size and complexity, and lowering optical power loss. It does so by using nanophotonic metasurface lenses and offers higher homogenization quality by mitigating the impact of diffraction and reducing the size of the optical system by combining the functionality of multiple optical elements into fewer devices. Overall, the metalenslet beam homogenizer represents a significant improvement over conventional beam homogenizers, offering a more efficient, more compact, and more reliable way to produce high-quality beam uniformity.