The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2026

Filed:

Mar. 23, 2025
Applicants:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;

Friedrich-schiller-universität Jena, Jena, DE;

Inventors:

Peter Schreiber, Jena, DE;

Rohan Kundu, Jena, DE;

Dirk Michaelis, Jena, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 27/09 (2006.01); F21V 5/00 (2018.01);
U.S. Cl.
CPC ...
G02B 3/0056 (2013.01); G02B 3/0062 (2013.01); G02B 27/0961 (2013.01); F21V 5/008 (2013.01);
Abstract

An optical beam former for generating an emerging light beam from an incident light beam includes a condenser lens array for receiving the incident light beam, wherein the condenser lens array includes a plurality of condenser lenses. The optical beam former includes a projection lens array arranged parallel to the condenser lens array for emitting the incident light beam, wherein the projection lens array comprises a plurality of projection lenses. The condenser lens array comprises at least one cluster of condenser lenses, wherein each condenser lens of the cluster comprises an aperture adapted to a subarea of an overall pattern projected by the optical beam former to provide, for the projection lens array, part of the incident light beam associated with the subarea of the overall pattern. A combination of the apertures of the condenser lenses is adapted to the overall pattern.


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