The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Oct. 11, 2022
Riber, Bezons, FR;
Youri Rousseau, Maisons Laffite, FR;
Jean-Louis Guyaux, La Vernelle, FR;
Alexandre Arnoult, Auzeville-Tolosane, FR;
RIBER, Bezons, FR;
Abstract
The invention relates to an instrument for measuring the curvature of a surface of a sample (), comprising a light source () and a mask (), Ie light source () illuminating the mask () so as to generate a light beam () incident on the surface of the sample and to form a light beam () reflected by the sample. According to the invention, the mask () comprises a transparent background and opaque patterns () arranged at predetermined positions, the opaque patterns () of the mask having a total surface area smaller than the surface area of the transparent background, the instrument comprises an imaging system () and a camera () suitable for forming an image () of the mask by reflection on the sample (), an image processing system being suitable for processing the image () of the mask by reflection on the surface of the sample, so as to deduce therefrom the radius of the curvature of the sample ().