The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2026

Filed:

Nov. 22, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Thomas Brezoczky, Los Gatos, CA (US);

Kirankumar Neelasandra Savandaiah, Bangalore, IN;

Arun Rengaraj, Nexus @ One-North, SG;

Sivakumar Ramalingam, Bangalore, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
C23C 14/566 (2013.01); C23C 14/54 (2013.01);
Abstract

The present disclosure provides shutter disk systems. The shutter disk systems include a body including a plurality of faces, a base, and a top. The body includes an interior volume. The interior volume includes an interlock region configured to receive at least one shutter disk. The interior volume includes an operation region adjacent to the interlock region, where the operational region is separate from the interlock region by an isolator plate. A shutter disk stack is disposed in the operational region. The shutter disk stack includes at least a storage rack configured to receive two or more shutter disks. A first door is disposed on a face of the plurality of faces proximal to the operational region. A second door is disposed proximal to the interlock region. A third door is disposed proximal to a portion of the interlock region and a portion of the operational region.


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