The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Mar. 28, 2024
Kwangwoon University Industry-academic Collaboration Foundation, Seoul, KR;
Yeonsoo Kim, Seoul, KR;
Yungun Jung, Seoul, KR;
Gyeonggwan Jeon, Seoul, KR;
Hyungjun Kim, Seoul, KR;
Abstract
An impurity removal amount prediction method in chemical process is provided. The impurity removal amount prediction method in chemical process according to the embodiments of the present invention comprises making neural network models learn using data from a chemical process and predicting removal amounts of impurities removed in the chemical process using the learned neural network models. The impurities are included in the feed supplied to reactors of the chemical process and are removed by reacting with catalysts disposed in the reactors. The reactors include a first reactor and a second reactor arranged in parallel. The neural network models include a first neural network model applied to the first reactor and a second neural network model applied to the second reactor. The neural network models learn in the direction to minimize the difference between the output data of the first neural network model and the second neural network model.