The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Sep. 21, 2022
Trumpf Laser—und Systemtechnik Gmbh, Ditzingen, DE;
Felix Zimmermann, Ditzingen, DE;
Malte Kumkar, Weimar, DE;
TRUMPF LASER- UND SYSTEMTECHNIK GMBH, Ditzingen, DE;
Abstract
A method for producing a light deflection structure includes the steps of: a) producing a first plurality of interaction regions, in which at least one laser beam interacts with the substrate material along a first path with a spatial overlap of the interaction regions, b) producing a second plurality of interaction regions with a spatial overlap of the interaction regions along a second path offset with respect and with a spatial overlap with the first path, c) optionally producing a further plurality of interaction regions with a spatial overlap of the further interaction regions along a further path offset with respect to and with a spatial overlap with the path used immediately before, and d) optionally carrying out step c) multiple times. The method also includes producing type II modifications of the substrate material, and changing at least one process parameter from one beam path to another beam path.