The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Apr. 03, 2024
Industrial Technology Research Institute, Hsinchu, TW;
Hsuan-Yu Huang, Hsinchu City, TW;
Jiun-Hua Li, Hsinchu City, TW;
Shen-Hua Peng, Taoyuan City, TW;
Lih-Tao Hsu, Zhubei City, TW;
Wei-Chieh Chang, Zhubei City, TW;
Bo-Yi Li, Zhubei City, TW;
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Abstract
A reciprocating concentration system includes: a gas output device, first and second liquid accommodating tanks, a selection device, first and second liquid sensors and a computing control device. The gas output device is controlled to output pushing gas through a first gas channel or a second gas channel. The first liquid accommodating tank is in communication with the first gas channel. The second liquid accommodating tank is in communication with the second gas channel. The selection device is in communication with the first liquid accommodating tank and the second liquid accommodating tank through a first liquid channel and a second liquid channel, respectively, and has a filtered liquid outlet. The first liquid sensor and the second liquid sensor are disposed at the first liquid channel and the second liquid channel, respectively. The computing control device is connected to the gas output device and the first and the second liquid sensors.