The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Jan. 08, 2024
Applicant:
Lutronic Corporation, Goyang-si, KR;
Inventor:
Kwangchon Ko, Goyang-si, KR;
Assignee:
LUTRONIC CORPORATION, Goyang-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/14 (2006.01); A61B 18/00 (2006.01);
U.S. Cl.
CPC ...
A61B 18/14 (2013.01); A61B 2018/00041 (2013.01); A61B 2018/00464 (2013.01); A61B 2018/00732 (2013.01); A61B 2018/00738 (2013.01);
Abstract
Disclosed are a treatment apparatus for denaturing tissue using RF energy having multiple frequencies, a control method thereof, and a treatment method using the same, in which skin treatment is performed using the RF energy with multiple-frequencies different in depth of delivering the RF energy into the tissue. The frequencies of the RF energy may be modulated by the RF modulator. Additionally, the operation of one of several RF generators, which can generate RF energy at the frequency of the RF energy, is determined by the selection of one among multiple RF generators.