The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Nov. 15, 2021
Applicant:

Kwangwoon University Industry-academic Collaboration Foundation, Seoul, KR;

Inventors:

Gi Chung Kwon, Seongnam-si, KR;

Hee Tae Kwon, Bucheon-si, KR;

Ji Hwan Kim, Goyang-si, KR;

Woo Jae Kim, Gimpo-si, KR;

In Young Bang, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01); H01J 37/32 (2006.01); H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
H10P 72/722 (2026.01); H01J 37/32724 (2013.01); H01J 2237/002 (2013.01); H01J 2237/2007 (2013.01);
Abstract

A cryogenic electrostatic chuck system and a method for controlling the same according to a preferred embodiment of the present invention is capable of performing a cryogenic process for a substrate, such as a cryogenic etching process and a cryogenic deposition process, even in a cryogenic range, and is capable of implementing a vertical etch profile, which is ideal for feature etching, with a high aspect ratio.


Find Patent Forward Citations

Kwon, Gi. (2026). Cryogenic electrostatic chuck system and method for controlling same (U.S. Patent No. 12721102). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12721102

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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