The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Dec. 11, 2023
Applicant:

Magnachip Semiconductor, Ltd., Cheongju-si, KR;

Inventors:

Young Seo Jo, Seoul, KR;

Ho Hyun Kim, Seoul, KR;

Ji Yong Lim, Seoul, KR;

Chan Ho Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 8/00 (2025.01); H10D 8/01 (2025.01); H10P 14/20 (2026.01);
U.S. Cl.
CPC ...
H10D 62/106 (2025.01); H10D 8/045 (2025.01); H10D 8/411 (2025.01); H10P 14/3822 (2026.01);
Abstract

A fast recovery diode includes a substrate; an epitaxial layer formed on the substrate; a P-type low-concentration doping region formed in an upper portion of the epitaxial layer and a P-type high-concentration doping region formed on the P-type low-concentration doping region; a P-type guard ring formed in the upper portion of the epitaxial layer to surround the P-type low-concentration doping region and P-type high-concentration doping region; a field oxide layer formed on the P-type guard ring and the P-type high-concentration doping region; an anode electrode formed to overlap the P-type high-concentration doping region and a portion of the field oxide layer; and a cathode electrode formed below the substrate.


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