The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Oct. 05, 2023
Applicant:
Tae Technologies, Inc., Foothill Ranch, CA (US);
Inventors:
Michl W. Binderbauer, Ladera Ranch, CA (US);
Sergei Putvinski, Dana Point, CA (US);
Artem N. Smirnov, Mission Viejo, CA (US);
Hiroshi Gota, Irvine, CA (US);
Thomas Roche, San Clemente, CA (US);
Michael Meekins, Silverado, CA (US);
Assignee:
TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/14 (2006.01); G21B 1/03 (2006.01); G21B 1/05 (2006.01); G21B 1/15 (2006.01); G21B 1/21 (2006.01);
U.S. Cl.
CPC ...
H05H 1/14 (2013.01); G21B 1/052 (2013.01); G21B 1/03 (2013.01); G21B 1/15 (2013.01); G21B 1/21 (2013.01);
Abstract
A high performance field reversed configuration (FRC) system includes a central confinement chamber, divertors coupled to the ends of the chamber, neutral beam injectors positioned about the chamber, and a magnetic system comprising quasi-dc coils axially positioned along the FRC system components.