The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Mar. 15, 2023
Applicant:

Hewlett Packard Enterprise Development Lp, Spring, TX (US);

Inventors:

Satish Kumar Mopur, Bangalore, IN;

Gunalan Perumal Vijayan, Bangalore, IN;

Shounak Bandopadhyay, Bangalore, IN;

Vijaya Sharvani Hindnavis, Bangalore, IN;

Krishnaprasad Lingadahalli Shastry, Bangalore, IN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 10/26 (2022.01); G06V 10/42 (2022.01); G06V 10/762 (2022.01);
U.S. Cl.
CPC ...
G06V 10/762 (2022.01); G06V 10/26 (2022.01); G06V 10/42 (2022.01);
Abstract

Systems and methods for preventing prediction performance degradation by detecting and extracting skews in data during both training and production environments is described herein. Feature extraction may be performed on training data during the training phase, followed by pattern analysis that assesses similarities across labeled training data sets. A reference pattern may be derived from the pattern analysis and feature extraction of the training data. Feature extraction and pattern analysis may be performed on production data during the serving phase, and a target pattern may be derived from the pattern analysis and feature extraction of the production data. The reference pattern and target pattern may be fed to a discrepancy detection functionality to detect discrepancies by using a sliding window to move the target pattern across the reference pattern to make comparisons between the patterns. The comparison may provide a quantitative skew across the training and production data.


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