The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Jun. 10, 2022
Applicants:

University of Central Florida Research Foundation, Inc., Orlando, FL (US);

Goertek Inc., Weifang, CN;

Inventors:

Jianghao Xiong, Orlando, FL (US);

Tao Zhan, Oviedo, FL (US);

Kun Li, Santa Clara, CA (US);

Shin-Tson Wu, Oviedo, FL (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/20 (2006.01); G02B 5/32 (2006.01); G03H 1/02 (2006.01); G03H 1/04 (2006.01);
U.S. Cl.
CPC ...
G03H 1/202 (2013.01); G02B 5/32 (2013.01); G03H 1/0256 (2013.01); G03H 2001/0439 (2013.01); G03H 2222/31 (2013.01); G03H 2240/53 (2013.01); G03H 2240/55 (2013.01); G03H 2250/38 (2013.01);
Abstract

Here discloses a method for duplicating a hologram and a hologram optical element. The method comprises: preparing a master with a master hologram; preparing a sample with coated photoalignment material layer above the master; and irradiating a recording light through the sample to the master, so that at least one portion of the recording light is reflected by the master as an object light carrying the master hologram information, and so that the object light and the recording light are interfered at the photoalignment material layer to produce a duplicated hologram in the photoalignment material layer.


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