The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Jan. 19, 2023
Fujifilm Corporation, Tokyo, JP;
Yusuke Namba, Shizuoka, JP;
Kazuaki Enomoto, Shizuoka, JP;
Ichiro Koyama, Shizuoka, JP;
Akira Sakaguchi, Shizuoka, JP;
Akira Yamamoto, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is an on-press development type lithographic printing plate precursor having two or more maximal absorption wavelengths in a wavelength range of 760 nm to 900 nm, in which in a case where the on-press development type lithographic printing plate precursor is subjected to exposure to infrared having a wavelength of 830 nm at an energy density of 110 mJ/cm, in a portion subjected to the exposure, a brightness change ΔL before the exposure and after storage subsequent to the exposure for 24 hours under conditions of 25° C. and 70% RH is 3.0 or more. Also provided are a method of preparing a lithographic printing plate and a lithographic printing method in which the on-press development type lithographic printing plate precursor is used.