The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
May. 19, 2023
Applicant:
Samsung Sdi Co., Ltd, Yongin-si, KR;
Inventors:
Seung Han, Suwon-si, KR;
Sangkyun Im, Suwon-si, KR;
Minyoung Lee, Suwon-si, KR;
Jimin Kim, Suwon-si, KR;
Yaeun Seo, Suwon-si, KR;
Bukeun Oh, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0042 (2013.01); G03F 7/11 (2013.01); G03F 7/2006 (2013.01);
Abstract
A semiconductor photoresist composition includes a first organometallic compound, a second organometallic compound, and a solvent. A method of forming patterns utilizing the same is provided.
Han, Seung. (2026). Semiconductor photoresist composition and method of forming patterns using the composition (U.S. Patent No. 12717228). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12717228
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile