The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Oct. 23, 2023
Applicant:
Sharp Kabushiki Kaisha, Sakai City, JP;
Inventors:
Kenzo Ohkubo, Sakai City, JP;
Takayuki Ohno, Sakai City, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Sakai City, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); G02B 26/10 (2006.01); G02B 26/12 (2006.01); G03G 15/043 (2006.01);
U.S. Cl.
CPC ...
G02B 26/123 (2013.01); G02B 26/105 (2013.01); G03G 15/0435 (2013.01);
Abstract
A rotational direction of a multi-beam light source around a rotational axis is made different to a side where a sub-scanning width in a sub-scanning direction of a plurality of light beams is made smaller between a case of one-side incidence in which the plurality of light beams are made incident to the rotary polygon mirror from either one of sides in the rotary axis direction of a rotary polygon mirror and a case of the other-side incidence in which the plurality of light beams are made incident to the rotary polygon mirror from the other side.