The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Mar. 13, 2024
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Fen Wan, Austin, TX (US);

Weijun Liu, Cedar Park, TX (US);

Toshiki Ito, Kawasaki-city, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 112/36 (2006.01);
U.S. Cl.
CPC ...
C08F 112/36 (2013.01);
Abstract

A photocurable composition can comprise comprising a polymerizable material, a photoinitiator, and a photoacid generator, wherein the polymerizable material comprises at least one multi-functional vinylbenzene monomer in an amount of at least 10 wt % based on the total weight of the polymerizable material and the photoinitiator includes an oxime ester compound. The photocurable composition can be suitable for inkjet adaptive planarization (IAP) processing and the forming of photo-cured layers having a high thermal stability and low thermal shrinkage.


Find Patent Forward Citations

Wan, Fen. (2026). Photocurable composition (U.S. Patent No. 12715942). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12715942

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…