The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Dec. 19, 2023
Mediatek Inc., Hsinchu City, TW;
Han-Sheng Huang, Hsinchu City, TW;
Bo-Shih Huang, Hsinchu City, TW;
MEDIATEK INC., Hsinchu City, TW;
Abstract
Electrostatic discharge (ESD) protection structures are provided. A first N-type well region is formed over a P-type semiconductor substrate. First P-type well region and second N-type well region are formed over the first N-type well region. A plurality of first device areas are formed over the first P-type well region. Each first device area includes a plurality of P-type fins extending in a first direction. The P-type fins are divided into a plurality of first groups in each of the first device areas. A second device area is formed over the first P-type well region, and includes a plurality of N-type fins extending in the first direction and surrounded by the first device areas. When an ESD event is present, an ESD current flows sequentially through the P-type fins, the first P-type well region and the N-type fins.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile