The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Nov. 17, 2025
Applicant:

Mark Morehouse, Costa Mesa, CA (US);

Inventor:

Mark Morehouse, Costa Mesa, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 7/08 (2006.01);
U.S. Cl.
CPC ...
H01F 7/081 (2013.01); H01F 2007/086 (2013.01);
Abstract

The present invention relates to a magnetic field configuration referred to as a Nested Dipole Gap Magnetic Field. The Nested Dipole Gap Magnetic Field is generated within a working gap region formed between two electromagnetic coil structures arranged to produce a coupled magnetic topology. Within the gap, a primary or main dipole magnetic field is established along a central region, while a secondary return magnetic field of opposite directional polarity is formed at larger radial distances surrounding the primary field. The secondary field encloses, confines, and stabilizes the primary magnetic field, resulting in a nested magnetic field distribution that creates a controlled spatial field boundary. This configuration enables magnetic field shaping, confinement, and isolation within a well-defined gap region, and is applicable to systems requiring controlled charged particle behavior, plasma confinement, ion acceleration regions, and electromagnetic reaction chambers.


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